中央研究院 原子與分子科學研究所

Focused ion beam (FIB) lithography can be used to selectively close nanochannels in an ordered array on an anodic-alumina film, producing templates with the nanochannels arranged in custom-designed geometries. Nanochannel closing can be monitored by in-situ FIB imaging. Nanodevices such as photonic-crystal waveguides could be fabricated using this technique.

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