Chemical-vapor-deposition synthesis and raman spectroscopic characterization of large-area graphene sheets.
Liao, C-D, Lu Y-Y, Tamalampudi SR, Cheng H-C, Chen Y-T.
Journal of Physical Chemistry, A. (doi: 10.1021/jp311757r) (2013)
We present a chemical vapor deposition (CVD) method to catalytically synthesize large-area, transferless, single-to few-layer graphene sheets using hexamethyldisilazane
(HMDS) on a SiO2/Si substrate as a carbon source and thermally evaporated alternating Ni/Cu/Ni layers as a catalyst. The as-synthesized graphenefilms were characterized by Raman
spectroscopic imaging to identify single- to few-layer sheets. This HMDS-derived graphene layer is continuous over the entire growth substrate, and single- to trilayer mixed sheets can be up to 30μm in the lateral dimension. With the synthetic CVD method proposed here, graphene can be grown into tailored shapes directly on a SiO2/Si surface through vapor priming ofHMDS onto predefined photolithographic patterns. The transparent and conductive HMDS-derived graphene exhibits itspotential for widespread electronic and opto-electronic applications.