The Surface Kinetics and Dynamics Laboratory concentrates mainly on elucidating the kinetics and dynamics of gas-surface interaction, the nanoscale structural transformation on semiconductor surfaces, and surface photochemistry. Two current research projects are (1) hydrogen atom induced structural phase transition and domain formation/stability on covalently bonded semiconductor surfaces (C, Si, and Ge); (2) adsorption and thermally-/photocatalytically- induced reactions of organic molecules on metal-covered TiO₂(110) surface. Related experiments are performed in UHV using single-crystal surfaces and various surface characterization techniques, including LEED, AES, HREELS, XPS, (AR)UPS, ISS and TPD/TPR. In addition, surface spectroscopic methods, e.g. FTIR and Raman scattering, are also employed to investigate the relaxation dynamics of surface adsorbates. Additional attention is paid to setting up UHV-STM to approach the atomic-level understanding of chemical processes occurring on solid surfaces. Results in this study would provide further insight into (1) surface structural and electronic properties; (2) surface reconstruction, bonding geometries, as well as surface-molecule interactions; and (3) local dynamics of the individual adsorbate.